By Michael White, Mentor Graphics Skipping nodes is gaining popularity, but it can bring some unexpected challenges. Are you prepared?
Calibre Pattern Matching enables innovative DRC and other applications across all process nodes and designs.
By Dina Medhat, Mentor Graphics Accurate verification of explicitly-defined analog design constraints is crucial for reliability and performance.
By John Ferguson, Mentor Graphics FOWLP design popularity is driving foundries to develop in-house FOWLP flows. How will that affect…
By David Abercrombie, Rehab Ali, Ahmed Hamed-Fatehy, and Shetha Nolke How the SID-SADP process affects your design decisions –
By Ruben Ghulghazaryan, Jeff Wilson, and Ahmed AbouZeid FEOL CMP modeling helps designers and foundries predict CMP hotspots in advanced…
Dina Medhat, Mentor Graphics ESD protection is critical, but difficult to verify. Using voltage propagation and logic-aware checks can help
By Matthew Hogan, Mentor Graphics Latch-up detection is challenging. Learn how automated LUP checks help you find and eliminate LUP…
By David Abercrombie, Mentor Graphics Untimely DP stitching can cause more problems than it solves, that’s why strategic use is…
