Smoothing the path to manufacturing success begins with CMP simulation and fill optimization

By Ruben Ghulghazaryan, Davit Piliposyan, Zhengfang Liu, Chunshan Du, Jeff Wilson, Qijian Wan, Xinyi Hu, Zhixi Chen Chemical-mechanical polishing (CMP)…

Using machine learning to improve DFM: a case study

By Ruben Ghulghazaryan, Davit Piliposyan, Misak Shoyan Several years ago, the American University of Armenia (AUA) and Siemens EDA began…

DFM: Still a really good thing to do!

By Simon Favre If you’re not using critical area analysis and design for manufacturing to improve your IC yield and…

What is critical area analysis and why should I care?

By Simon Favre What makes money in the semiconductor industry? A killer IC design? Something so innovative that it blows…

Machine learning-enabled closed loop DFM

SPIE-ing at a distance…

The SPIE Advanced Lithography Digital Forum took place Feb 22-26, and of course, Siemens EDA was there! We wouldn’t miss…

Direct write DEF is DEFinitely the way to go for DFM back-annotation

By Armen Asatryan, James Paris – Mentor, A Siemens Business DFM back-annotation to P&R Back-annotation of DFM changes to P&R…

Back-annotating DFM enhancements to place & route tools

Back-annotating DFM enhancements to place & route tools

By James Paris, Mentor Graphics Back-annotation of DFM enhancements to P&R simplifies iterations as designers close timing and physical verification

Synthesis of Design Rules and Patterns

Synthesis of Design Rules and Patterns

By Michael White, Mentor Graphics Integrating pattern matching with design verification and process development yields benefits at all nodes. Learn…

Reliability Scoring for the Automotive Market

Reliability Scoring for the Automotive Market

By Jeff Wilson, Mentor Graphics Companies designing automotive electronics must understand how variability affects design quality and reliability.