The Fill Ecosystem Evolves Again

By Jeff Wilson, Mentor Graphics At 20nm, new fill constraints drive up the time and…

Video: ECO Fill Flow Framework

A video introduction to Mentor’s newly introduced utility called ecofill….

Automated Chip Polishing Can Make Your Design Shine

By Bill Graupp, Mentor Graphics A more robust design creates a more reliable product, and…

Are Three Eyes Better Than Two?

By David Abercrombie, Mentor Graphics Error analysis in triple patterning is challenging, but a pyramid…

Balancing on the Color Density Tightrope

By David Abercrombie Potential pitfalls and available solutions….

Capacity Constraints and DFM at Mature Nodes

By Jeff Wilson, Mentor Graphics Design for manufacturing – it’s a variety of practices that…

Cutting Fab Costs and Turnaround Time with Smart, Automated Resource Management

By Mark Simmons, Mentor Graphics Simple in theory, challenging in reality…

Self-Aligned Double Patterning, Part Deux

By David Abercrombie, Mentor Graphics Part 2 of a walk-through of the SADP process.  …

The Route to Faster Physical Verification and Better Designs

By Nancy Nguyen and Jean-Marie Brunet, Mentor Graphics Using the most accurate and up-to-date signoff…