Deja Vu for CMP Modeling?

Deja Vu for CMP Modeling?

By Jeff Wilson, Mentor Graphics With manufacturing innovations and new DFM solutions, CMP modeling is gaining renewed popularity

The Fill Ecosystem Evolves Again

The Fill Ecosystem Evolves Again

By Jeff Wilson, Mentor Graphics At 20nm, new fill constraints drive up the time and complexity of the fill process….

Video: ECO Fill Flow Framework

Video: ECO Fill Flow Framework

A video introduction to Mentor’s newly introduced utility called ecofill.

Automated Chip Polishing Can Make Your Design Shine

Automated Chip Polishing Can Make Your Design Shine

By Bill Graupp, Mentor Graphics A more robust design creates a more reliable product, and reduces yield variability over its…

Are Three Eyes Better Than Two?

Are Three Eyes Better Than Two?

By David Abercrombie, Mentor Graphics Error analysis in triple patterning is challenging, but a pyramid approach helps designers prioritize and…

Balancing on the Color Density Tightrope

Balancing on the Color Density Tightrope

By David Abercrombie Potential pitfalls and available solutions.

Capacity Constraints and DFM at Mature Nodes

Capacity Constraints and DFM at Mature Nodes

By Jeff Wilson, Mentor Graphics Design for manufacturing – it’s a variety of practices that can improve yield and prevent…

Cutting Fab Costs and Turnaround Time with Smart, Automated Resource Management

Cutting Fab Costs and Turnaround Time with Smart, Automated Resource Management

By Mark Simmons, Mentor Graphics Simple in theory, challenging in reality

Self-Aligned Double Patterning, Part Deux

Self-Aligned Double Patterning, Part Deux

By David Abercrombie, Mentor Graphics Part 2 of a walk-through of the SADP process.