SPIE-ing at a distance…

Machine learning-enabled closed loop DFM

The SPIE Advanced Lithography Digital Forum took place Feb 22-26, and of course, Siemens EDA was there! We wouldn’t miss one of the premier events for the lithography community, even if we did have to attend from our home offices this year. In addition to listening to keynote speakers discuss challenges in the industry, our own experts were busy presenting new solutions across a wide range of topics, including optical and EUV lithography, patterning technologies, metrology, process integration for semiconductor manufacturing, and more.

Siemens EDA staff authored or co-authored eight papers:

If you’re interested in learning more about our work in any of these fields, let us know! Call us at 1-800-547-3000, or send us a note telling us what topics you’d like more information about.

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