The SPIE Advanced Lithography Digital Forum took place Feb 22-26, and of course, Siemens EDA was there! We wouldn’t miss…
By Ruben Ghulghazaryan, Jeff Wilson, and Ahmed AbouZeid FEOL CMP modeling helps designers and foundries predict CMP hotspots in advanced…
By Jeff Wilson, Mentor Graphics With manufacturing innovations and new DFM solutions, CMP modeling is gaining renewed popularity
