Efficient package delivery is not just for FedEx!

By John Ferguson Cost, risk, and the limitations of monolithic scaling are driving growth in…

Shining a light on silicon photonics verification

By John Ferguson, Omar ElSewefy, Nermeen Hossam, Basma Serry We’re all fascinated by light. Light…

A SAMPle of what you need to know about SAMP technology

By Calibre Design Staff Prior to the availability of extreme ultraviolet (EUV) lithography, multi-patterning provided…

Give me my space! Why high voltage and multiple power domain designs need automated context-aware spacing checks

By Sherif Hany and Abdellah Bakhali Regardless of which technology node they’re using, design houses…

GLOBALFOUNDRIES and Mentor Launch a New Innovative DRC+ Hotspot Solution using Machine Learning in Calibre

By Shelly Stalnaker – Mentor, A Siemens Business I recently had the chance to attend…

SAMP series finishes with SAMP cut mask decomposition techniques

By David Abercrombie and Rehab Kotb Ali – Mentor, A Siemens Business We’ve been writing…

Are You (Really) Ready for Your Next Node?

By Michael White, Mentor Graphics Skipping nodes is gaining popularity, but it can bring some…

A Pattern of Success: Calibre Pattern Matching

Calibre Pattern Matching enables innovative DRC and other applications across all process nodes and designs….

Mentor’s Battle of the Photonic Bulge

By Mitch Heins If silicon photonics verification is a battle to be won, Mentor Graphics…