SAMP series finishes with SAMP cut mask decomposition techniques

By David Abercrombie and Rehab Kotb Ali – Mentor, A Siemens Business We’ve been writing…

Are You (Really) Ready for Your Next Node?

By Michael White, Mentor Graphics Skipping nodes is gaining popularity, but it can bring some…

A Pattern of Success: Calibre Pattern Matching

Calibre Pattern Matching enables innovative DRC and other applications across all process nodes and designs….

Mentor’s Battle of the Photonic Bulge

By Mitch Heins If silicon photonics verification is a battle to be won, Mentor Graphics…

All Together Now: FOWLP in the Foundry

By John Ferguson, Mentor Graphics FOWLP design popularity is driving foundries to develop in-house FOWLP…

The Pitfalls of Auto-Stitching in Double-Patterning

By David Abercrombie, Mentor Graphics Untimely DP stitching can cause more problems than it solves,…

Established Technology Nodes: The Most Popular Kid at the Dance

By Michael White, Mentor Graphics Established nodes have a lot of dancing left to do!…

Pattern Matching In Test and Yield Analysis

By Jonathan Muirhead and Geir Eide, Mentor Graphics Analyzing fail data with pattern matching helps…

Not yet a fan of fan-out? Why you should be!

By John Ferguson, Mentor Graphics FO-WLP combines multiple die from heterogeneous processes into a compact…