By John Ferguson, Omar ElSewefy, Nermeen Hossam, Basma Serry We’re all fascinated by light. Light beams shooting from aliens’ eyes,…
By Calibre Design Staff Prior to the availability of extreme ultraviolet (EUV) lithography, multi-patterning provided the only workable yield solution…
By Sherif Hany and Abdellah Bakhali Regardless of which technology node they’re using, design houses that create high-voltage and multiple…
By Shelly Stalnaker – Mentor, A Siemens Business I recently had the chance to attend an on-demand webinar introducing the…
By David Abercrombie and Rehab Kotb Ali – Mentor, A Siemens Business We’ve been writing about self-aligned multi-patterning (SAMP) topics…
By Michael White, Mentor Graphics Skipping nodes is gaining popularity, but it can bring some unexpected challenges. Are you prepared?
Calibre Pattern Matching enables innovative DRC and other applications across all process nodes and designs.
By Mitch Heins If silicon photonics verification is a battle to be won, Mentor Graphics is on the front lines…
By John Ferguson, Mentor Graphics FOWLP design popularity is driving foundries to develop in-house FOWLP flows. How will that affect…
