Don’t like standing in lines? Get with the (right) programs!

By John Ferguson For a while, it appeared that the worst of the COVID pandemic was behind us. My mind…

So you think you know symmetry? Think again…

By Sherif Hany “The Art of Analog Layout” is one of the canonical books addressing concepts behind layout design techniques…

Efficient package delivery is not just for FedEx!

By John Ferguson Cost, risk, and the limitations of monolithic scaling are driving growth in multi-die (heterogeneous) advanced IC packaging…

Shining a light on silicon photonics verification

By John Ferguson, Omar ElSewefy, Nermeen Hossam, Basma Serry We’re all fascinated by light. Light beams shooting from aliens’ eyes,…

A SAMPle of what you need to know about SAMP technology

By Calibre Design Staff Prior to the availability of extreme ultraviolet (EUV) lithography, multi-patterning provided the only workable yield solution…

Give me my space! Why high voltage and multiple power domain designs need automated context-aware spacing checks

By Sherif Hany and Abdellah Bakhali Regardless of which technology node they’re using, design houses that create high-voltage and multiple…

GLOBALFOUNDRIES and Mentor Launch a New Innovative DRC+ Hotspot Solution using Machine Learning in Calibre

By Shelly Stalnaker – Mentor, A Siemens Business I recently had the chance to attend an on-demand webinar introducing the…

SAMP series finishes with SAMP cut mask decomposition techniques

By David Abercrombie and Rehab Kotb Ali – Mentor, A Siemens Business We’ve been writing about self-aligned multi-patterning (SAMP) topics…

Are You (Really) Ready for Your Next Node?

Are You (Really) Ready for Your Next Node?

By Michael White, Mentor Graphics Skipping nodes is gaining popularity, but it can bring some unexpected challenges. Are you prepared?