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Siemens shines at the 2025 SPIE Advanced Lithography + Patterning symposium

March 13, 2025

The SPIE Advanced Lithography + Pattering symposiums were held 23-27 February this year with the usual enthusiastic and sizable attendance…

By Design With Calibre
6 MIN READ

A new method of scaling and efficiency for the semi-manufacturing flow

January 9, 2023

By Beth Martin Calibre sets sail on Kubernetes While most Calibre semi-manufacturing jobs still run on on-premises compute clusters using…

By Design With Calibre
3 MIN READ

Curves ahead for IC manufacturing

June 20, 2022

By John Sturtevant It turns out that the ideal mask pattern to print such a circle is in fact a…

By Design With Calibre
2 MIN READ
Machine learning-enabled closed loop DFM

SPIE-ing at a distance…

March 3, 2021

The SPIE Advanced Lithography Digital Forum took place Feb 22-26, and of course, Siemens EDA was there! We wouldn’t miss…

By Design With Calibre
< 1 MIN READ
Sign-off lithography simulation and multi-patterning must play well together

Sign-off lithography simulation and multi-patterning must play well together

March 10, 2015

By Joe Kwan, Mentor Graphics At 20 nm and below, designers must ensure their lithography simulation can incorporate and analyze…

By Design With Calibre
4 MIN READ
What about MEMS?

What about MEMS?

February 12, 2015

By Carey Robertson, Mentor Graphics With circuit performance driven by capacitance values, accurate calculations are critical for MEMs designers.

By Design With Calibre
4 MIN READ