Stay ahead with our expert insights on advanced IC design and manufacturing. Discover Calibre verification breakthroughs, yield and process improvement strategies and the latest trends driving performance and efficiency in advanced technologies.
By Carey Robertson, Mentor Graphics With circuit performance driven by capacitance values, accurate calculations are critical for MEMs designers.
By Michael White, Mentor Graphics An overview to the mystery of Multi-Patterning
By Frank Feng, Mentor Graphics Electrostatic discharge can destroy a circuit, but designing adequate protection is not always a matter…
By David Abercrombie, Mentor Graphics A walk-through of the SADP process for success.
By Karen Chow, Mentor Graphics How does multi-patterning impact parasitic extraction? How many corners do you really need?
By Jeff Wilson, Mentor Graphics Using hierarchy in the fill process provides greater control for the designers, improves consistency throughout…
