Stay ahead with our expert insights on advanced IC design and manufacturing. Discover Calibre verification breakthroughs, yield and process improvement strategies and the latest trends driving performance and efficiency in advanced technologies.
By Matthew Hogan, Mentor Graphics Reliability issues have gone way beyond DRC and LVS verification…
By Jeff Wilson, Mentor Graphics At 20nm, new fill constraints drive up the time and complexity of the fill process….
By Beth Martin with Dina Medhat, Mentor Graphics What do all these new voltage-dependent DRC rules mean, and how do…
A video introduction to Mentor’s newly introduced utility called ecofill.
By Carey Robertson, Mentor Graphics The Calibre xACT platform is a new type of extraction tool that provides a range…
By Bill Graupp, Mentor Graphics A more robust design creates a more reliable product, and reduces yield variability over its…
By David Abercrombie, Mentor Graphics Error analysis in triple patterning is challenging, but a pyramid approach helps designers prioritize and…
By Srinivas Velivala, Mentor Graphics New debugging capabilities in Calibre RealTime can help shrink your time-to-tapeout while still ensuring high-quality…
By Michael White, Mentor Graphics Much of the Internet of Things (IoT) functionality we crave is more cost-effective when implemented…
