Calibre IC Design & Manufacturing

Stay ahead with our expert insights on advanced IC design and manufacturing. Discover Calibre verification breakthroughs, yield and process improvement strategies and the latest trends driving performance and efficiency in advanced technologies.

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Self-Aligned Double Patterning, Part One

Self-Aligned Double Patterning, Part One

January 27, 2015

By David Abercrombie, Mentor Graphics A walk-through of the SADP process for success.    

By Calibre IC Design & Manufacturing
6 MIN READ
Are multi-patterning corners for parasitic extraction really necessary for 16/14 nm?

Are multi-patterning corners for parasitic extraction really necessary for 16/14 nm?

January 27, 2015

By Karen Chow, Mentor Graphics How does multi-patterning impact parasitic extraction? How many corners do you really need?  

By Calibre IC Design & Manufacturing
5 MIN READ
How to Survive the Perfect Storm of Changing Fill Requirements

How to Survive the Perfect Storm of Changing Fill Requirements

January 27, 2015

By Jeff Wilson, Mentor Graphics Using hierarchy in the fill process provides greater control for the designers, improves consistency throughout…

By Calibre IC Design & Manufacturing
5 MIN READ