Stay ahead with our expert insights on advanced IC design and manufacturing. Discover Calibre verification breakthroughs, yield and process improvement strategies and the latest trends driving performance and efficiency in advanced technologies.
By David Abercrombie, Rehab Ali, Ahmed Hamed-Fatehy, and Shetha Nolke How the SID-SADP process affects your design decisions –
By Ruben Ghulghazaryan, Jeff Wilson, and Ahmed AbouZeid FEOL CMP modeling helps designers and foundries predict CMP hotspots in advanced…
Dina Medhat, Mentor Graphics ESD protection is critical, but difficult to verify. Using voltage propagation and logic-aware checks can help
By Matthew Hogan, Mentor Graphics Latch-up detection is challenging. Learn how automated LUP checks help you find and eliminate LUP…
By David Abercrombie, Mentor Graphics Untimely DP stitching can cause more problems than it solves, that’s why strategic use is…
By Michael White, Mentor Graphics Established nodes have a lot of dancing left to do! Learn how and why new…
By James Paris, Mentor Graphics Back-annotation of DFM enhancements to P&R simplifies iterations as designers close timing and physical verification
By Phil Brooks, Mentor Graphics Can you accurately extract device pin-specific properties without creating phantom nets?
By Michael White, Mentor Graphics Integrating pattern matching with design verification and process development yields benefits at all nodes. Learn…
