Latest posts

The Fill Ecosystem Evolves Again

The Fill Ecosystem Evolves Again

By Jeff Wilson, Mentor Graphics At 20nm, new fill constraints drive up the time and complexity of the fill process….

Automate those voltage-dependent DRC checks!

Automate those voltage-dependent DRC checks!

By Beth Martin with Dina Medhat, Mentor Graphics  What do all these new voltage-dependent DRC rules mean, and how do…

Video: ECO Fill Flow Framework

Video: ECO Fill Flow Framework

A video introduction to Mentor’s newly introduced utility called ecofill.

Extraction Challenges Grow in Advanced Nanometer IC Design

Extraction Challenges Grow in Advanced Nanometer IC Design

By Carey Robertson, Mentor Graphics The Calibre xACT platform is a new type of extraction tool that provides a range…

Automated Chip Polishing Can Make Your Design Shine

Automated Chip Polishing Can Make Your Design Shine

By Bill Graupp, Mentor Graphics A more robust design creates a more reliable product, and reduces yield variability over its…

Are Three Eyes Better Than Two?

Are Three Eyes Better Than Two?

By David Abercrombie, Mentor Graphics Error analysis in triple patterning is challenging, but a pyramid approach helps designers prioritize and…

Custom Layout Designers Need New Tools for New and Expanding Markets

Custom Layout Designers Need New Tools for New and Expanding Markets

By Srinivas Velivala, Mentor Graphics New debugging capabilities in Calibre RealTime can help shrink your time-to-tapeout while still ensuring high-quality…

IoT, Cost-per-Transistor Extend Lifetimes of Established Technology Nodes

IoT, Cost-per-Transistor Extend Lifetimes of Established Technology Nodes

By Michael White, Mentor Graphics Much of the Internet of Things (IoT) functionality we crave is more cost-effective when implemented…

How Close Can We Put Different Voltage Regions Together?

How Close Can We Put Different Voltage Regions Together?

By Joe Davis, Mentor Graphics  Calibre tools provide a complete flow for implementing, optimizing, and verifying voltage-dependent layouts against the…