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The Route to Faster Physical Verification and Better Designs

The Route to Faster Physical Verification and Better Designs

By Nancy Nguyen and Jean-Marie Brunet, Mentor Graphics Using the most accurate and up-to-date signoff engine instead of a limited…

What about MEMS?

What about MEMS?

By Carey Robertson, Mentor Graphics With circuit performance driven by capacitance values, accurate calculations are critical for MEMs designers.

A Look Behind the Mask of Multi-Patterning

A Look Behind the Mask of Multi-Patterning

By Michael White, Mentor Graphics An overview to the mystery of Multi-Patterning

My Design’s Interconnect Has Enough Wire Width to Withstand ESD… Doesn’t It?

My Design’s Interconnect Has Enough Wire Width to Withstand ESD… Doesn’t It?

By Frank Feng, Mentor Graphics Electrostatic discharge can destroy a circuit, but designing adequate protection is not always a matter…

Self-Aligned Double Patterning, Part One

Self-Aligned Double Patterning, Part One

By David Abercrombie, Mentor Graphics A walk-through of the SADP process for success.    

Are multi-patterning corners for parasitic extraction really necessary for 16/14 nm?

Are multi-patterning corners for parasitic extraction really necessary for 16/14 nm?

By Karen Chow, Mentor Graphics How does multi-patterning impact parasitic extraction? How many corners do you really need?  

How to Survive the Perfect Storm of Changing Fill Requirements

How to Survive the Perfect Storm of Changing Fill Requirements

By Jeff Wilson, Mentor Graphics Using hierarchy in the fill process provides greater control for the designers, improves consistency throughout…