Latest Posts

Automated common resistance checking…it’s the smart thing to do!

By Hossam Sarhan – Mentor, A Siemens Business Work smarter, not harder. Isn’t that what…

Automate via insertion for improved design reliability and performance

By Fady Fouad, Esraa Swillam, and Jeff Wilson – Mentor, A Siemens Business IR drop…

Design integrity checks help clear systematic errors during implementation

By James Paris and Armen Asatryan – Mentor, A Siemens Business Automated short checking during…

Mentor, AMD, and Microsoft collaborate on EDA in the cloud

By Omar El-Sewefy – Mentor, A Siemens Business While cloud processing has been around for…

The “next” technology node: are you ready?

By Michael White, John Ferguson, and Shelly Stalnaker – Mentor, A Siemens Business In the…

Track decomposition for SAMP processes—What you need to know

By David Abercrombie and Rehab Kotb-Ali – Mentor, A Siemens Business Understanding key requirements and…

Open letter to the IC design community

Joseph Sawicki – executive vice president, Mentor IC EDA Access free 30-Day On-Demand Training, plus…

Smoothing the path to manufacturing success begins with CMP simulation and fill optimization

By Ruben Ghulghazaryan, Davit Piliposyan, Zhengfang Liu, Chunshan Du, Jeff Wilson, Qijian Wan, Xinyi Hu,…

Innovations in physical verification and cloud computing keep the IC industry moving forward

By John Ferguson – Mentor, A Siemens Business Faced with growing technological complexity, EDA companies…