By David Abercrombie, Mentor Graphics Many people think EUV lithography means the end of multi-patterning. Do you?
By Elven Huang, Mentor Graphics Accurate SRAM IP verification can be tricky, but automated pattern matching can help.
Calibre eqDRC enables SiP designers to accurately verify non-Manhattan shapes in SiP designs.
By Michael White, Mentor Graphics Skipping nodes is gaining popularity, but it can bring some unexpected challenges. Are you prepared?
Calibre Pattern Matching enables innovative DRC and other applications across all process nodes and designs.
By Dina Medhat, Mentor Graphics Accurate verification of explicitly-defined analog design constraints is crucial for reliability and performance.
By John Ferguson, Mentor Graphics FOWLP design popularity is driving foundries to develop in-house FOWLP flows. How will that affect…
By David Abercrombie, Rehab Ali, Ahmed Hamed-Fatehy, and Shetha Nolke How the SID-SADP process affects your design decisions –
By Ruben Ghulghazaryan, Jeff Wilson, and Ahmed AbouZeid FEOL CMP modeling helps designers and foundries predict CMP hotspots in advanced…
