What is critical area analysis and why should I care?

By Simon Favre What makes money in the semiconductor industry? A killer IC design? Something…

A Pattern of Success: Calibre Pattern Matching

Calibre Pattern Matching enables innovative DRC and other applications across all process nodes and designs….

Back-annotating DFM enhancements to place & route tools

By James Paris, Mentor Graphics Back-annotation of DFM enhancements to P&R simplifies iterations as designers…

Synthesis of Design Rules and Patterns

By Michael White, Mentor Graphics Integrating pattern matching with design verification and process development yields…

Reliability Scoring for the Automotive Market

By Jeff Wilson, Mentor Graphics Companies designing automotive electronics must understand how variability affects design…

Deja Vu for CMP Modeling?

By Jeff Wilson, Mentor Graphics With manufacturing innovations and new DFM solutions, CMP modeling is…

Automated Chip Polishing Can Make Your Design Shine

By Bill Graupp, Mentor Graphics A more robust design creates a more reliable product, and…

IoT, Cost-per-Transistor Extend Lifetimes of Established Technology Nodes

By Michael White, Mentor Graphics Much of the Internet of Things (IoT) functionality we crave…

Capacity Constraints and DFM at Mature Nodes

By Jeff Wilson, Mentor Graphics Design for manufacturing – it’s a variety of practices that…