Will EUV Kill Multi-Patterning?

By David Abercrombie, Mentor Graphics Many people think EUV lithography means the end of multi-patterning….

Fill/Cut Self-Aligned Double-Patterning

By David Abercrombie, Rehab Ali, Ahmed Hamed-Fatehy, and Shetha Nolke How the SID-SADP process affects…

The Pitfalls of Auto-Stitching in Double-Patterning

By David Abercrombie, Mentor Graphics Untimely DP stitching can cause more problems than it solves,…

How Do I ECO a Multi-Patterned Design?

By David Abercrombie and Alex Pearson, Mentor Graphics Applying ECOs to multiĀ­patterned designs can be…

When and How Should I Color My DP Layout?

By David Abercrombie, Mentor Graphics Automated DP coloring solutions minimize DP errors. But when is…

Parasitic Extraction for Accurate Signal Integrity Analysis at Advanced Nodes

By Karen Chow, Mentor Graphics Signal integrity analysis at advanced nodes requires new and enhanced…

Five Steps to Double Patterning Debug Sucess

By David Abercrombie, Mentor Graphics Shhhh…David Abercrombie’s revealing the secrets of successful DP debugging!…

Resetting Expectations on Multi-Patterning Decomposition and Checking Part 2

By David Abercrombie, Mentor Graphics Triple and quadruple patterning can baffle even the most experienced…

Resetting Expectations on Multi-Patterning Decomposition and Checking

By David Abercrombie, Mentor Graphics Some common misconceptions about multi-patterning processes and just how they…