Shifting left with Calibre solutions: Enhancing IP design flow efficiency and design quality

By Terry Meeks Designing integrated circuits (ICs) is a multifaceted task that requires the integration of various components, including intellectual…

Updating a Calibre DesignEnhancer via insertion kit is fast and easy!

By Jimmy Tien The Calibre® DesignEnhancer Via use model provides an automated via insertion process based on foundry design rule…

Introducing Calibre DesignEnhancer design-stage layout optimization!

By Jeff Wilson Introduced in early 2023, the Calibre DesignEnhancer tool is part of a growing suite of shift-left tools…

Direct write DEF is DEFinitely the way to go for DFM back-annotation

By Armen Asatryan, James Paris DFM back-annotation to P&R Back-annotation of DFM changes to P&R databases can be a pain….

Smoothing the path to manufacturing success begins with CMP simulation and fill optimization

By Ruben Ghulghazaryan, Davit Piliposyan, Zhengfang Liu, Chunshan Du, Jeff Wilson, Qijian Wan, Xinyi Hu, Zhixi Chen Chemical-mechanical polishing (CMP)…

Using machine learning to improve DFM: a case study

By Ruben Ghulghazaryan, Davit Piliposyan, Misak Shoyan Several years ago, the American University of Armenia (AUA) and Siemens EDA began…

DFM: Still a really good thing to do!

By Simon Favre If you’re not using critical area analysis and design for manufacturing to improve your IC yield and…

What is critical area analysis and why should I care?

By Simon Favre What makes money in the semiconductor industry? A killer IC design? Something so innovative that it blows…

Machine learning-enabled closed loop DFM

SPIE-ing at a distance…

The SPIE Advanced Lithography Digital Forum took place Feb 22-26, and of course, Siemens EDA was there! We wouldn’t miss…