SAMP series finishes with SAMP cut mask decomposition techniques

By David Abercrombie and Rehab Kotb Ali – Mentor, A Siemens Business We’ve been writing…

Will EUV Kill Multi-Patterning?

By David Abercrombie, Mentor Graphics Many people think EUV lithography means the end of multi-patterning….

Fill/Cut Self-Aligned Double-Patterning

By David Abercrombie, Rehab Ali, Ahmed Hamed-Fatehy, and Shetha Nolke How the SID-SADP process affects…

The Pitfalls of Auto-Stitching in Double-Patterning

By David Abercrombie, Mentor Graphics Untimely DP stitching can cause more problems than it solves,…

How Do I ECO a Multi-Patterned Design?

By David Abercrombie and Alex Pearson, Mentor Graphics Applying ECOs to multi­patterned designs can be…

Colorless vs. Colored Double-Patterning Design Flows

By David Abercrombie, Mentor Graphics How do you know which double patterning flow to use?…

When and How Should I Color My DP Layout?

By David Abercrombie, Mentor Graphics Automated DP coloring solutions minimize DP errors. But when is…

Parasitic Extraction for Accurate Signal Integrity Analysis at Advanced Nodes

By Karen Chow, Mentor Graphics Signal integrity analysis at advanced nodes requires new and enhanced…

Five Steps to Double Patterning Debug Sucess

By David Abercrombie, Mentor Graphics Shhhh…David Abercrombie’s revealing the secrets of successful DP debugging!…