By David Abercrombie and Rehab Kotb Ali – Mentor, A Siemens Business We’ve been writing about self-aligned multi-patterning (SAMP) topics…
By David Abercrombie, Mentor Graphics Many people think EUV lithography means the end of multi-patterning. Do you?
By David Abercrombie, Rehab Ali, Ahmed Hamed-Fatehy, and Shetha Nolke How the SID-SADP process affects your design decisions –
By David Abercrombie, Mentor Graphics Untimely DP stitching can cause more problems than it solves, that’s why strategic use is…
By David Abercrombie and Alex Pearson, Mentor Graphics Applying ECOs to multipatterned designs can be a nightmare, unless you plan…
By David Abercrombie, Mentor Graphics How do you know which double patterning flow to use?
By David Abercrombie, Mentor Graphics Automated DP coloring solutions minimize DP errors. But when is the best time and how…
By Karen Chow, Mentor Graphics Signal integrity analysis at advanced nodes requires new and enhanced parasitic extraction techniques
By David Abercrombie, Mentor Graphics Shhhh…David Abercrombie’s revealing the secrets of successful DP debugging!
