Resetting Expectations on Multi-Patterning Decomposition and Checking Part 2

By David Abercrombie, Mentor Graphics Triple and quadruple patterning can baffle even the most experienced…

Resetting Expectations on Multi-Patterning Decomposition and Checking

By David Abercrombie, Mentor Graphics Some common misconceptions about multi-patterning processes and just how they…

Reported Death of Moore’s Law Premature?

By Michael White, Mentor Graphics Is Moore’s Law dying? A look at the latest process…

Case Studies in P&R Double Patterning Debug: Part Two

David Abercrombie continues his expert advice to P&R and chip finishing engineers on understanding and…

Case Studies in Double-Patterning Debug: Part One

By David Abercrombie, Mentor Graphics Multi-patterning errors in P&R layouts can be intricate, and their…

Are Three Eyes Better Than Two?

By David Abercrombie, Mentor Graphics Error analysis in triple patterning is challenging, but a pyramid…

Balancing on the Color Density Tightrope

By David Abercrombie Potential pitfalls and available solutions….

Self-Aligned Double Patterning, Part Deux

By David Abercrombie, Mentor Graphics Part 2 of a walk-through of the SADP process.  …

Sign-off lithography simulation and multi-patterning must play well together

By Joe Kwan, Mentor Graphics At 20 nm and below, designers must ensure their lithography…