By David Abercrombie, Mentor Graphics Triple and quadruple patterning can baffle even the most experienced designers. David Abercrombie has some…
By David Abercrombie, Mentor Graphics Some common misconceptions about multi-patterning processes and just how they work.
By David Abercrombie, Mentor Graphics Error analysis in triple patterning is challenging, but a pyramid approach helps designers prioritize and…
By Joe Kwan, Mentor Graphics At 20 nm and below, designers must ensure their lithography simulation can incorporate and analyze…
By Carey Robertson, Mentor Graphics With circuit performance driven by capacitance values, accurate calculations are critical for MEMs designers.
By Michael White, Mentor Graphics An overview to the mystery of Multi-Patterning
