Siemens stochastic-aware OPC reduces EUV stochastic failures at wafer level for SRAM and logic, validating predictive modeling with experimental data.
The SPIE Advanced Lithography + Pattering symposiums were held 23-27 February this year with the usual enthusiastic and sizable attendance…
By Beth Martin Calibre sets sail on Kubernetes While most Calibre semi-manufacturing jobs still run on on-premises compute clusters using…
By John Sturtevant It turns out that the ideal mask pattern to print such a circle is in fact a…
The SPIE Advanced Lithography Digital Forum took place Feb 22-26, and of course, Siemens EDA was there! We wouldn’t miss…
By Joe Kwan, Mentor Graphics At 20 nm and below, designers must ensure their lithography simulation can incorporate and analyze…
By Carey Robertson, Mentor Graphics With circuit performance driven by capacitance values, accurate calculations are critical for MEMs designers.
