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By David Abercrombie, Mentor Graphics Triple and quadruple patterning can baffle even the most experienced designers. David Abercrombie has some…
By David Abercrombie, Mentor Graphics Some common misconceptions about multi-patterning processes and just how they work.
By Michael White, Mentor Graphics Is Moore’s Law dying? A look at the latest process node activity and technology
David Abercrombie continues his expert advice to P&R and chip finishing engineers on understanding and debugging multi-patterning errors accurately and…
By David Abercrombie, Mentor Graphics Multi-patterning errors in P&R layouts can be intricate, and their solutions may not be obvious
By David Abercrombie, Mentor Graphics Error analysis in triple patterning is challenging, but a pyramid approach helps designers prioritize and…
By David Abercrombie Potential pitfalls and available solutions.
By David Abercrombie, Mentor Graphics Part 2 of a walk-through of the SADP process.
By Joe Kwan, Mentor Graphics At 20 nm and below, designers must ensure their lithography simulation can incorporate and analyze…
