Latest posts

Bridging the gap: Unlock seamless collaboration in IC design with Calibre Connectivity Interface

Calibre Connectivity Interface (CCI) seamlessly connects EDA tools for advanced IC design verification. It transforms LVS into a powerful data source, enabling critical analyses like parasitic extraction & power integrity.

The IC designers complete guide to design rule checking

Design rule checking (DRC) ensures IC layouts meet foundry rules. Learn how modern DRC engines like Calibre deliver scalable, sign-off accuracy at advanced nodes

IC visualization: Supercharge debug of hidden parasitic threats with Calibre

By Omar Elabd If you’ve ever watched your simulation pass with flying colors, only to see your silicon fail in…

From translator to powerhouse: Calibre V2LVS second generation redefines LVS verification

Explore second-generation Calibre Verilog-to-LVS: up to 4X faster runtimes, 92% less memory use, smarter debugging and robust SoC verification for advanced digital designs

Design rule checking in today’s integrated circuit design environment

Explore integrated circuit design rule checking (DRC) in modern integrated circuit design, from increasing complexity to fast-feedback solutions like Calibre nmDRC Recon. Learn use cases, challenges and future trends.

Boost simulation results with powerful selective net extraction with Calibre xACT

By Karen Chow In advanced integrated circuit (IC) design, post-layout parasitic extraction is crucial for accurate performance analysis and optimization….

Safeguarding IC reliability: Calibre PERC’s latch-up guard ring check

Ensure robust latch-up protection in your ICs with Calibre PERC’s comprehensive ESDA verification checks. Identify and resolve issues early, improve reliability, and accelerate time-to-market.

Driving 3D IC innovation with Calibre multiphysics: A holistic approach for next-generation design

By John Ferguson Fun fact: The concept of 3D integrated circuits (3D ICs) has been around since shortly after the…

Siemens-imec collaboration reduces stochastic failures in EUV lithography by orders of magnitude in wafer-level experimental validation

Siemens stochastic-aware OPC reduces EUV stochastic failures at wafer level for SRAM and logic, validating predictive modeling with experimental data.