Language and Library Trends This blog is a continuation of a series of blogs, which present the highlights from the…
User Adoption of OVM Featured; Views on UVM Discussed The Mentor Graphics user group meeting, User-2-User, in Santa Clara is…
IEEE Standards Association Hosts Design Automation Standardization Workshops in Bangalore & Delhi I, along with several other individuals, will participate…
Standard Co-Emulation Modeling Interface (SCE-MI) 2.1 Improves Verification Productivity The Accellera Interface Technical Subcommittee (ITC) completed version 2.1 of the…
23rd Synopsys EDA Interoperability Forum Features a Verification Session with focus on the UVM Register Package As readers of the…
United States Plays Host in Seattle, WA The IEC’s 47th General Assembly meeting opened on October 11th in Seattle, WA…
DAC Attendees Invited to Accellera’s Breakfast sponsored by Mentor, Cadence & Synopsys The full statement can be read at EDA…
Visit Booth 1350 – The hub of OVM/UVM Activity at DAC The OVM World booth at the Design Automation Conference…
UVM: Charting the New Territory At this year’s DAC, Accellera introduces UVM (Universal Verification Methodology) to the world at its…
