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Solving IR drop and layout bottlenecks: How Calibre DesignEnhancer streamlines IC design

March 12, 2025

By Jeff Wilson As an IC designer, you know that achieving an optimal layout is about more than just meeting…

By Calibre IC Design & Manufacturing
5 MIN READ

Direct write DEF is DEFinitely the way to go for DFM back-annotation

July 18, 2022

By Armen Asatryan, James Paris DFM back-annotation to P&R Back-annotation of DFM changes to P&R databases can be a pain….

By Calibre IC Design & Manufacturing
< 1 MIN READ
Back-annotating DFM enhancements to place & route tools

Back-annotating DFM enhancements to place & route tools

September 19, 2016

By James Paris, Mentor Graphics Back-annotation of DFM enhancements to P&R simplifies iterations as designers close timing and physical verification

By Calibre IC Design & Manufacturing
4 MIN READ
Case Studies in P&R Double Patterning Debug: Part Two

Case Studies in P&R Double Patterning Debug: Part Two

September 22, 2015

David Abercrombie continues his expert advice to P&R and chip finishing engineers on understanding and debugging multi-patterning errors accurately and…

By Calibre IC Design & Manufacturing
8 MIN READ
Case Studies in Double-Patterning Debug: Part One

Case Studies in Double-Patterning Debug: Part One

September 15, 2015

By David Abercrombie, Mentor Graphics Multi-patterning errors in P&R layouts can be intricate, and their solutions may not be obvious

By Calibre IC Design & Manufacturing
10 MIN READ
The Route to Faster Physical Verification and Better Designs

The Route to Faster Physical Verification and Better Designs

February 24, 2015

By Nancy Nguyen and Jean-Marie Brunet, Mentor Graphics Using the most accurate and up-to-date signoff engine instead of a limited…

By Calibre IC Design & Manufacturing
4 MIN READ