By John Sturtevant It turns out that the ideal mask pattern to print such a circle is in fact a…
By Vikas Gupta and Bhavani Prasad, Mentor Graphics Automated ECO fill helps you refill and re-verify late-stage changes quickly, while…
By David Abercrombie, Mentor Graphics Many people think EUV lithography means the end of multi-patterning. Do you?
By Ruben Ghulghazaryan, Jeff Wilson, and Ahmed AbouZeid FEOL CMP modeling helps designers and foundries predict CMP hotspots in advanced…
By Nancy Nguyen and Jean-Marie Brunet, Mentor Graphics Using the most accurate and up-to-date signoff engine instead of a limited…
By Michael White, Mentor Graphics An overview to the mystery of Multi-Patterning
