By Ethan Maguire As the semiconductor industry continues to push the boundaries of feature size and density, the need for…
By Calibre Design Staff Prior to the availability of extreme ultraviolet (EUV) lithography, multi-patterning provided the only workable yield solution…
The SPIE Advanced Lithography Digital Forum took place Feb 22-26, and of course, Siemens EDA was there! We wouldn’t miss…
By David Abercrombie, Mentor Graphics Many people think EUV lithography means the end of multi-patterning. Do you?
