By James Paris, Mentor Graphics Back-annotation of DFM enhancements to P&R simplifies iterations as designers close timing and physical verification
David Abercrombie continues his expert advice to P&R and chip finishing engineers on understanding and debugging multi-patterning errors accurately and…
By David Abercrombie, Mentor Graphics Multi-patterning errors in P&R layouts can be intricate, and their solutions may not be obvious
By Nancy Nguyen and Jean-Marie Brunet, Mentor Graphics Using the most accurate and up-to-date signoff engine instead of a limited…
