By Ruben Ghulghazaryan, Jeff Wilson, and Ahmed AbouZeid FEOL CMP modeling helps designers and foundries…
By Joe Kwan, Mentor Graphics At 20 nm and below, designers must ensure their lithography…
By Carey Robertson, Mentor Graphics With circuit performance driven by capacitance values, accurate calculations are…
By Michael White, Mentor Graphics An overview to the mystery of Multi-Patterning…
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