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20nm

Creating An Accurate FEOL CMP Model

Creating An Accurate FEOL CMP Model

November 21, 2016

By Ruben Ghulghazaryan, Jeff Wilson, and Ahmed AbouZeid FEOL CMP modeling helps designers and foundries predict CMP hotspots in advanced…

By Design With Calibre
9 MIN READ
Sign-off lithography simulation and multi-patterning must play well together

Sign-off lithography simulation and multi-patterning must play well together

March 10, 2015

By Joe Kwan, Mentor Graphics At 20 nm and below, designers must ensure their lithography simulation can incorporate and analyze…

By Design With Calibre
4 MIN READ
What about MEMS?

What about MEMS?

February 12, 2015

By Carey Robertson, Mentor Graphics With circuit performance driven by capacitance values, accurate calculations are critical for MEMs designers.

By Design With Calibre
4 MIN READ
A Look Behind the Mask of Multi-Patterning

A Look Behind the Mask of Multi-Patterning

January 28, 2015

By Michael White, Mentor Graphics An overview to the mystery of Multi-Patterning

By Design With Calibre
9 MIN READ