By Ruben Ghulghazaryan, Jeff Wilson, and Ahmed AbouZeid FEOL CMP modeling helps designers and foundries predict CMP hotspots in advanced…
By Joe Kwan, Mentor Graphics At 20 nm and below, designers must ensure their lithography simulation can incorporate and analyze…
By Carey Robertson, Mentor Graphics With circuit performance driven by capacitance values, accurate calculations are critical for MEMs designers.
By Michael White, Mentor Graphics An overview to the mystery of Multi-Patterning
