How to extend DTCO for today’s competitive IC landscape

By Le Hong As semiconductor components continue to shrink, the challenges associated with design-for-manufacturing (DFM) and design-technology co-optimization (DTCO) increase….

A recap of Calibre at DAC 2023

DAC is back! At least was the feeling on the floor, judging by the number of attendees we talked to,…

Are you a C++ developer or programmer? You may want to read this…

By day, Fedor Pikus is head of the Advanced Projects Team in Siemens Digital Industries Software. His responsibilities include planning…

Calibre IC manufacturing research for what comes next

By Germain Fenger Director of Product Management RET modeling, Calibre Semiconductor Manufacturing Solutions There is no rest in semiconductor manufacturing….

Siemens shares mPower best new software in 2022 awards with TSMC

By Michael Buehler-Garcia In 2022, the mPower EM/IR power analysis solution from Siemens EDA received the following awards: In reality,…

Cross-platform database validation: Don’t add applications without it!

By James Paris The OASIS* database format is a widely used industry standard in electronic design automation (EDA) software for…

Siemens EDA celebrates 20 years of collaboration with imec

By Germain Fenger, Director of Product Management RET modelingCalibre Semiconductor Manufacturing solutions This year marks the 20th anniversary of the…

A novel methodology for EM assessment in on-power grids can improve power, time-to-market, and design cost

By Valeriy Sukharev, Armen Kteyan, Jun-Ho Choy Achieving an accurate assessment of electromigration (EM)-induced failure is essential to developing a…

A new method of scaling and efficiency for the semi-manufacturing flow

By Beth Martin Calibre sets sail on Kubernetes While most Calibre semi-manufacturing jobs still run on on-premises compute clusters using…