By Dina Medhat, Mentor Graphics Automated voltage propagation provides an accurate way to detect and correct those hard-to-find EOS conditions…
David Abercrombie continues his expert advice to P&R and chip finishing engineers on understanding and debugging multi-patterning errors accurately and…
By David Abercrombie, Mentor Graphics Multi-patterning errors in P&R layouts can be intricate, and their solutions may not be obvious
By Matthew Hogan, Mentor Graphics Reliability issues have gone way beyond DRC and LVS verification…
By Jeff Wilson, Mentor Graphics At 20nm, new fill constraints drive up the time and complexity of the fill process….
By Beth Martin with Dina Medhat, Mentor Graphics What do all these new voltage-dependent DRC rules mean, and how do…
A video introduction to Mentor’s newly introduced utility called ecofill.
By Carey Robertson, Mentor Graphics The Calibre xACT platform is a new type of extraction tool that provides a range…
By Bill Graupp, Mentor Graphics A more robust design creates a more reliable product, and reduces yield variability over its…
