By David Abercrombie, Mentor Graphics Multi-patterning errors in P&R layouts can be intricate, and their solutions may not be obvious
By Matthew Hogan, Mentor Graphics Reliability issues have gone way beyond DRC and LVS verification…
By Jeff Wilson, Mentor Graphics At 20nm, new fill constraints drive up the time and complexity of the fill process….
By Beth Martin with Dina Medhat, Mentor Graphics What do all these new voltage-dependent DRC rules mean, and how do…
A video introduction to Mentor’s newly introduced utility called ecofill.
By Carey Robertson, Mentor Graphics The Calibre xACT platform is a new type of extraction tool that provides a range…
By Bill Graupp, Mentor Graphics A more robust design creates a more reliable product, and reduces yield variability over its…
By David Abercrombie, Mentor Graphics Error analysis in triple patterning is challenging, but a pyramid approach helps designers prioritize and…
By Srinivas Velivala, Mentor Graphics New debugging capabilities in Calibre RealTime can help shrink your time-to-tapeout while still ensuring high-quality…
