Siemens Digital Industries Software Blog Network

Siemens Digital Industries Software Blogs


Polarion

Featured Extension: Live Status Reveals Optimal Work Item Flow and Current State

People who are new to Polarion (and even some who are not so new) often take quite some time before they look into the many Polarion extensions available on the Polarion Extension Portal. This is und...

Community

Newest Community Feature: Badges!

Have you ever wondered what motivates someone to share something?  I’m an avid user of Trip Advisor, especially when I travel. I’ve found some great food establishments all over the w...

Electronic Systems Design

Behind the Design: Qualcomm Technologies Inc.

This is the fourth post in a series showcasing the winners of the 2014 Technology Leadership Awards. View the previous...

Calibre IC Design & Manufacturing

A Look Behind the Mask of Multi-Patterning

By Michael White, Mentor Graphics An overview to the mystery of Multi-Patterning

Calibre IC Design & Manufacturing

My Design's Interconnect Has Enough Wire Width to Withstand ESD... Doesn't It?

By Frank Feng, Mentor Graphics Electrostatic discharge can destroy a circuit, but designing adequate protection is not always a matter...

Solid Edge

Interview with Jeff Walker, Director of Solid Edge Products

J eff Walker is the Director of Solid Edge Products. He's heavily involved in the development prcoess, and one of the guys who really knows the software inside out because he's been involved in sp...

Calibre IC Design & Manufacturing

Self-Aligned Double Patterning, Part One

By David Abercrombie, Mentor Graphics A walk-through of the SADP process for success.    

Calibre IC Design & Manufacturing

Are multi-patterning corners for parasitic extraction really necessary for 16/14 nm?

By Karen Chow, Mentor Graphics How does multi-patterning impact parasitic extraction? How many corners do you really need?  

Calibre IC Design & Manufacturing

How to Survive the Perfect Storm of Changing Fill Requirements

By Jeff Wilson, Mentor Graphics Using hierarchy in the fill process provides greater control for the designers, improves consistency throughout...