What’s New in Multi-Patterning?

If you work with multi-patterning technology, you know it is a constantly-evolving process. From the addition of new multi-patterning techniques to the way designers and engineers manage and optimize multi-patterned designs, changes seem to come fast and furious. How do you keep up with new processes and best practices?

 

Fortunately, you have our multi-patterning expert, David Abercrombie, to help you. David has been a leader and innovator in the development and enhancement of multi-patterning technologies and tools, from the earliest and “simplest” double patterned layouts to today’s array of complex multi-patterning techniques. His many articles, papers, and videos on multi-patterning issues and technologies provide a detailed roadmap that enables you to not only understand how multi-patterning changes the design process, but also how you can anticipate and mitigate the potentially unwelcome effects multi-patterning can bring to the design flow.

Because David’s work appears in many places, it can be challenging to find just the right topic when you need it. To make it easier for you, we collect all of David’s multi-patterning advice in one simple resource, David Abercrombie Talks Multi-Patterning.

In the latest update, now available on Mentor.com, David adds new information about the cutting-edge MP topics such as:

  • ECOS and multi-patterning: minimizing the impact of recoloring your layout after an ECO.
  • Clearing up common misconceptions about multi-patterning that can affect your productivity and the quality of your results.
  • Enhanced MP error visualization at advanced nodes that helps you understand complex DP constraints and debug MP errors more quickly and accurately
  • Optimizing color assignments to improve both manufacturing yield and design performance

 

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This article first appeared on the Siemens Digital Industries Software blog at https://blogs.sw.siemens.com/calibre/2018/01/17/whats-new-in-multi-patterning/