Help your students learn the history and current state of OPC technology and Source Mask Optimization (SMO) technology.
Optical proximity correction (OPC) is a photolithography enhancement technique commonly used to compensate for image errors due to diffraction or process effects. The need for OPC is seen mainly in the making of semiconductor devices and is due to the limitations of light to maintain the edge placement integrity of the original design, after processing, into the etched image on the silicon wafer.
This material can easily fit into your course and can bolster the skills of undergraduate and graduate students in computer engineering, electronics and telecommunications.
Learn more about our Academic Partner Program here.