Mentor Graphics at SPIE Advanced Lithography 2017
SPIE Advanced Lithography, the premier conference for the lithography community, will be held at the San Jose Convention Center February 26 – March 2, 2017. Mentor Graphics experts will be delivering conference papers, post sessions, and answering your questions in booth 221.
View the full conference agenda here.
CONFERENCE PAPERS
Overview and Development of EDA Tools for Integration of DSA into Patterning Solutions
Tuesday, February 28 | 1:30pm
Process, Design Rule, and Layout Co-Optimization for DSA Based Patterning of Sub-10nm FinFET Devices
Tuesday, February 28 | 2:20pm
Enhanced OPC Recipe Coverage and Early Hotspot Detection through Automated Layout Generation and Analysis
Wednesday, March 1 | 3:20pm
Enabling Full-Field OPC Correction via Dynamic Model Generation
Wednesday, March 1 | 4:00pm
Directed Self-Assembly (DSA) of Lamella-Type of Copolymers in Self-Aligned Via (SAV) Application from Design to Patterning
Wednesday, March 1 | 4:10pm
Effective Use of Aerial Image Metrology for Calibration of OPC Models
Thursday, March 2 | 8:40am
Si-Photonics Waveguides Manufacturability Using Advanced RET Solutions
Thursday, March 2 | 9:40am
FinFET-Induced Anisotropy in Printing of Implantation Shapes
Thursday, March 2 | 11:35am
POSTER SESSIONS
Tuesday, Feb 28 | 6:00-8:00pm
Model-Based Guiding Pattern Synthesis for Ontarget and Robust Assembly of Via and Contact Layers using DSA
Lithography and OPC Friendly Triple Patterning Decomposition Method for Via
Application of Optical Similarity in OPC Model Calibration
A Flexible and Efficient Way to Set-up QA System Based on Pattern Database Management
EXHIBIT FLOOR
Visit our experts in booth 221 to learn about our best-in-class technology, comprehensive solutions, development and production support, and continuous innovation. The challenges of developing advanced lithography flows require a strong partner. With a complete design-to-manufacturing platform for Immersion Lithography, EUV and DSA, Mentor Graphics is the ideal partner for semiconductor manufacturing success.
Tuesday, February 28 | 10:00am – 5:00pm
Wednesday, March 1 | 10:00am – 4:00pm
For more on Mentor Graphics at SPIE Advanced Lithography, check out: What to see at SPIE 2017
