{"id":1342,"date":"2026-02-27T16:19:47","date_gmt":"2026-02-27T21:19:47","guid":{"rendered":"https:\/\/blogs.sw.siemens.com\/semiconductor-packaging\/?p=1342"},"modified":"2026-03-27T09:13:28","modified_gmt":"2026-03-27T13:13:28","slug":"3d-ic-thermal-design-packaging-strategies","status":"publish","type":"post","link":"https:\/\/blogs.sw.siemens.com\/semiconductor-packaging\/2026\/02\/27\/3d-ic-thermal-design-packaging-strategies\/","title":{"rendered":"Advanced thermal design strategies for 3D IC\u00a0systems\u00a0"},"content":{"rendered":"\n<p>Not long ago,&nbsp;OpenAI CEO Sam Altman remarked that advanced AI video generation workloads were pushing GPUs toward their thermal limits. While dramatic,&nbsp;the statement reflects a very real engineering challenge in today\u2019s AI and high-performance computing (HPC) systems:&nbsp;<\/p>\n\n\n\n<h2 class=\"wp-block-heading\"><strong>As chips become smarter and more powerful,&nbsp;do they inevitably run hotter?<\/strong>&nbsp;<\/h2>\n\n\n\n<p>With 3D ICs becoming the foundation of next-generation AI accelerators,&nbsp;thermal management is no longer a secondary design consideration. In stacked die configurations,&nbsp;heat flow is constrained in three dimensions,&nbsp;actively limiting achievable frequency,&nbsp;expanding&nbsp;guardbands&nbsp;and&nbsp;introducing earlier-than-expected reliability risks.&nbsp;<\/p>\n\n\n\n<p>This article examines advanced thermal design considerations specific to&nbsp;<a href=\"https:\/\/www.siemens.com\/en-us\/products\/ic-packaging\/3d-ic-design\/\" target=\"_blank\" rel=\"noreferrer noopener\">3D IC packaging<\/a>. It explores how thermal behavior in stacked architectures differs fundamentally from traditional 2D monolithic SoC designs,&nbsp;outlines key challenges unique to heterogeneous integration&nbsp;and&nbsp;presents practical strategies for building thermal confidence into modern 3D IC packaging workflows.&nbsp;<\/p>\n\n\n\n<h2 class=\"wp-block-heading\"><strong>Why thermal management is&nbsp;more challenging&nbsp;in 3D IC packaging<\/strong>&nbsp;<\/h2>\n\n\n\n<p>The fundamental laws of heat transfer have not changed. What has changed are the boundary conditions. In 3D&nbsp;IC&nbsp;packaging,&nbsp;architectural and packaging decisions amplify thermal constraints that were manageable in planar designs.&nbsp;<\/p>\n\n\n\n<p class=\"has-text-align-center\"><img loading=\"lazy\" decoding=\"async\" width=\"624\" height=\"299\" src=\"blob:https:\/\/blogs.sw.siemens.com\/67616783-73d3-46f2-aaac-9a125015f848\"><\/p>\n\n\n\n<p class=\"has-text-align-center\">Figure 1.\u00a0Illustration of thermal distribution in a 3D IC package.\u00a0<\/p>\n\n\n\n<p><strong>#1 Vertical stacking increases thermal resistance sensitivity<\/strong>&nbsp;<\/p>\n\n\n\n<p>Stacking dies&nbsp;up&nbsp;increases&nbsp;localized volumetric power density&nbsp;while restricting natural heat dissipation paths.&nbsp;In most 3D IC systems,&nbsp;the primary heat sink&nbsp;remains&nbsp;on one side of the stack. Intermediate dies must dissipate heat through multiple material interfaces before reaching that boundary.&nbsp;&nbsp;<\/p>\n\n\n\n<p>Each&nbsp;additional&nbsp;interface (bonding layers,&nbsp;micro-bumps,&nbsp;underfill and substrates) adds&nbsp;<a href=\"https:\/\/blogs.sw.siemens.com\/semiconductor-packaging\/2025\/08\/19\/ic-package-thermal-resistance-accurate-modeling-for-system-level-ic-thermal-reliability\/\" target=\"_blank\" rel=\"noreferrer noopener\">thermal resistance that compounds vertically<\/a>.&nbsp;As&nbsp;a&nbsp;result,&nbsp;small changes&nbsp;in interface properties or stack order can produce disproportionately large temperature differences across the&nbsp;system.&nbsp;<\/p>\n\n\n\n<p>Unlike traditional 2D monolithic SoCs,&nbsp;where lateral heat spreading dominates,&nbsp;stacked architectures introduce strong vertical conduction bottlenecks. Thinned dies reduce in-plane spreading capability,&nbsp;making junction temperature&nbsp;highly sensitive&nbsp;to vertical stack configuration. In high-power AI accelerators,&nbsp;modest packaging changes can shift hotspot locations or increase peak junction temperature by double-digit degrees Celsius.&nbsp;&nbsp;<\/p>\n\n\n\n<p><strong>#2&nbsp;Thermal&nbsp;coupling becomes systemic<\/strong>&nbsp;<\/p>\n\n\n\n<p>In 3D architectures,&nbsp;temperature change&nbsp;within one die can elevate temperatures in adjacent dies through shared vertical conduction paths,&nbsp;even when each die independently&nbsp;meets&nbsp;their&nbsp;thermal limits.&nbsp;&nbsp;<\/p>\n\n\n\n<p>For instance,&nbsp;a&nbsp;high-bandwidth memory&nbsp;(HBM)&nbsp;stack can alter the thermal gradient of a neighboring&nbsp;compute&nbsp;tile. A logic die can pre-heat stacked memory layers beneath it. Such&nbsp;coupled effects often&nbsp;emerge&nbsp;late in the design cycle when packaging-level thermal modeling is either simplified or disconnected from early architectural planning.&nbsp;&nbsp;<\/p>\n\n\n\n<p>Complexity is further intensified by structural and material factors intrinsic to advanced packaging,&nbsp;including:&nbsp;<\/p>\n\n\n\n<ul class=\"wp-block-list\">\n<li>TSVs\u00a0acting as unintended thermal bridges\u00a0<\/li>\n<\/ul>\n\n\n\n<ul class=\"wp-block-list\">\n<li>Micro-bump arrays\u00a0modifying\u00a0local thermal resistance distributions\u00a0<\/li>\n<\/ul>\n\n\n\n<ul class=\"wp-block-list\">\n<li>Thinned dies diminishing lateral heat-spreading capability\u00a0<\/li>\n<\/ul>\n\n\n\n<ul class=\"wp-block-list\">\n<li>Anisotropic and temperature-dependent material properties influencing conduction behavior\u00a0<\/li>\n<\/ul>\n\n\n\n<p><strong>#3 Traditional thermal analysis flow&nbsp;is unscalable<\/strong>&nbsp;<\/p>\n\n\n\n<p>In traditional 2D IC flows,&nbsp;thermal validation is often performed late in the design cycle and driven by domain specialists. In 3D ICs,&nbsp;that&nbsp;sequencing leads to late-stage surprises,&nbsp;including hotspot escalation,&nbsp;gradient-driven reliability risks,&nbsp;EMIR sensitivity&nbsp;shifts&nbsp;and&nbsp;thermo-mechanical stress interactions.&nbsp;<\/p>\n\n\n\n<p>To ensure reliable AI system performance,&nbsp;thermal analysis must shift left \u2014 into early architectural planning and stack definition \u2014 where design flexibility still exists.&nbsp;<\/p>\n\n\n\n<p>EDA vendors such as Siemens support this shift by integrating early-stage thermal feasibility&nbsp;analysis with progressive refinement toward signoff accuracy. Designers can begin with limited inputs and incrementally incorporate detailed power maps,&nbsp;layout data&nbsp;and&nbsp;material parameters as the design matures.&nbsp;<\/p>\n\n\n<div class=\"wp-block-image\">\n<figure class=\"aligncenter size-full is-resized\"><a href=\"https:\/\/resources.sw.siemens.com\/en-US\/video-intel-foundry-3d-ic-thermal-workflow\/\" target=\"_blank\" rel=\"noopener\"><img loading=\"lazy\" decoding=\"async\" width=\"628\" height=\"330\" src=\"https:\/\/blogs.sw.siemens.com\/wp-content\/uploads\/sites\/64\/2026\/02\/image.png\" alt=\"\" class=\"wp-image-1343\" style=\"width:792px;height:auto\" srcset=\"https:\/\/blogs.sw.siemens.com\/wp-content\/uploads\/sites\/64\/2026\/02\/image.png 628w, https:\/\/blogs.sw.siemens.com\/wp-content\/uploads\/sites\/64\/2026\/02\/image-600x315.png 600w\" sizes=\"auto, (max-width: 628px) 100vw, 628px\" \/><\/a><\/figure><\/div>\n\n\n<p>Figure 2.&nbsp;Intel Foundry presentation: 3D IC thermal workflow&nbsp;<\/p>\n\n\n\n<p><a href=\"https:\/\/resources.sw.siemens.com\/en-US\/video-intel-foundry-3d-ic-thermal-workflow\/\" target=\"_blank\" rel=\"noreferrer noopener\"><strong>Watch the Intel Foundry video to see how Siemens collaborates to streamline 3D IC thermal analysis.<\/strong><\/a><strong>&nbsp;<\/strong>Discover how the integrated workflow enables electronics designers to run early-stage thermal simulations using&nbsp;Calibre&nbsp;3DThermal from architectural planning through final signoff while accelerating model creation and refinement for thermal domain experts.&nbsp;<\/p>\n\n\n\n<h2 class=\"wp-block-heading\"><strong>Four key thermal design considerations in 3D ICs<\/strong>&nbsp;<\/h2>\n\n\n\n<p>As integration density increases,&nbsp;several recurring thermal risk modes consistently surface in advanced 3D IC packaging flows.&nbsp;<\/p>\n\n\n\n<p><strong>#1&nbsp;Address hotspot&nbsp;amplification<\/strong>&nbsp;<\/p>\n\n\n\n<p>In vertically integrated stacks,&nbsp;high-activity functional blocks positioned away from primary heat removal paths (heat spreaders,&nbsp;lids,&nbsp;cold plates) are particularly vulnerable.&nbsp;Thinned silicon reduces lateral heat spreading capability,&nbsp;while stacked bonding layers and micro-bump interfaces introduce cumulative vertical thermal resistance. The result is&nbsp;amplified&nbsp;thermal sensitivity: localized junction temperatures can escalate rapidly under peak AI workloads.&nbsp;<\/p>\n\n\n\n<p>Because thermal impedance is strongly influenced by stack order, interface material&nbsp;selection&nbsp;and&nbsp;bonding configuration, these decisions lock in thermal behavior early. Once defined, mitigation options narrow significantly. Late-stage thermal violations&nbsp;frequently&nbsp;force architectural compromises including frequency reduction, power throttling&nbsp;or&nbsp;guardband&nbsp;expansion directly&nbsp;impacting&nbsp;performance targets.&nbsp;<\/p>\n\n\n\n<p><strong>#2&nbsp;Validate thermo-mechanical&nbsp;stress&nbsp;<\/strong>&nbsp;<\/p>\n\n\n\n<p>Sustained temperature gradients across dissimilar materials introduce cyclic thermo-mechanical stresses due to mismatched coefficients of thermal expansion (CTE). In 3D stacks,&nbsp;these stresses concentrate in micro-bump arrays,&nbsp;hybrid bonding interfaces,&nbsp;TSV&nbsp;regions&nbsp;and&nbsp;underfill layers.&nbsp;<\/p>\n\n\n\n<p>Even when average die temperatures&nbsp;remain&nbsp;within specification,&nbsp;spatial&nbsp;gradients&nbsp;and transient swing,&nbsp;especially&nbsp;under bursty AI&nbsp;workloads,&nbsp;can accelerate fatigue mechanisms,&nbsp;including interconnect cracking,&nbsp;delamination&nbsp;and&nbsp;interface degradation.&nbsp;Over time,&nbsp;these effects degrade long-term reliability and may erode yield,&nbsp;even when static thermal summaries appear acceptable.&nbsp;<\/p>\n\n\n\n<p><strong>#3&nbsp;Verify&nbsp;thermal&nbsp;interactions at system levels<\/strong>&nbsp;<\/p>\n\n\n\n<p>In traditional flows,&nbsp;thermal verification is often performed&nbsp;late&nbsp;and driven by simplified models or abstracted boundary assumptions. In dense 3D IC architectures,&nbsp;this approach underrepresents inter-die thermal coupling,&nbsp;interface resistance variability,&nbsp;material anisotropy,&nbsp;etc.&nbsp;<\/p>\n\n\n\n<p>At advanced packaging densities, thermal verification must carry rigor comparable to timing closure or power integrity signoff. When thermal fidelity is insufficient, teams compensate through conservative&nbsp;guardbanding, over-designed cooling&nbsp;solutions&nbsp;or&nbsp;worst-case modeling assumptions. In the most severe cases, incomplete thermal modeling leads to post-silicon performance degradation where silicon meets power targets, but sustained workload operation reveals hidden thermal bottlenecks.&nbsp;<\/p>\n\n\n\n<p><strong>#4 Avoid&nbsp;overrelying&nbsp;on cooling to fix what the stack cannot dissipate<\/strong>&nbsp;<\/p>\n\n\n\n<p>In many 3D IC programs,&nbsp;teams assume that increasing cooling capacity will resolve thermal challenges late in the design. However,&nbsp;materials and internal interfaces,&nbsp;such as thermal interface materials,&nbsp;underfill layers,&nbsp;interposers&nbsp;and&nbsp;substrates,&nbsp;often dominate the overall thermal resistance of the stack. When these internal heat paths are constrained,&nbsp;stronger external cooling may lower the average temperature but leaves localized hotspots only partially improved.&nbsp;&nbsp;<\/p>\n\n\n\n<p>As a result,&nbsp;designs can continue to face thermal limits despite significant investment in cooling solutions. In practice,&nbsp;optimizing&nbsp;die placement,&nbsp;stack structure&nbsp;and&nbsp;interface&nbsp;properties early&nbsp;often&nbsp;delivers&nbsp;greater thermal benefit than downstream cooling enhancements. This is why packaging- and stack-level thermal evaluation should occur before&nbsp;finalizing&nbsp;the cooling strategy,&nbsp;ensuring internal thermal bottlenecks are addressed rather than masked.&nbsp;<\/p>\n\n\n\n<h2 class=\"wp-block-heading\"><strong>Key thermal design strategies for 3D ICs<\/strong>&nbsp;<\/h2>\n\n\n\n<p><strong>#1 Thermal-aware&nbsp;floorplanning<\/strong>&nbsp;<\/p>\n\n\n\n<p>In 3D IC architectures,&nbsp;thermal analysis must resolve both vertical and lateral heat conduction paths,&nbsp;including die-to-die coupling,&nbsp;micro-bump&nbsp;and hybrid bonding interfaces,&nbsp;TSV thermal bridges&nbsp;and&nbsp;interposer \/&nbsp;substrate conduction. As thermal behavior evolves with design decisions,&nbsp;simplified die-only models or abstract boundary assumptions cannot capture these effects with sufficient fidelity for architectural decisions.&nbsp;<\/p>\n\n\n\n<p>Thermal-aware&nbsp;floorplanning&nbsp;is paramount. IC designers introduce rough predictive thermal inputs early, such as estimated power maps, simplified stack&nbsp;assumptions&nbsp;and&nbsp;first-order boundary conditions to&nbsp;anticipate&nbsp;where hotspots may develop and how heat will propagate across dies and through the package. These early models&nbsp;don\u2019t&nbsp;need signoff-level accuracy. They need to be directionally&nbsp;correct&nbsp;so architects can move high-power blocks, separate competing heat&nbsp;sources&nbsp;or&nbsp;adjust die ordering while flexibility still exists.&nbsp;<\/p>\n\n\n\n<p>To support this approach,&nbsp;the EDA flow must allow early power-to-thermal correlation,&nbsp;fast abstraction-level&nbsp;modeling&nbsp;and&nbsp;consistent handoff from architectural exploration to detailed&nbsp;multiphysics&nbsp;analysis. Thermal data need to stay synchronized as floorplans evolve.&nbsp;This increasingly requires an integrated flow that bridges chip,&nbsp;package&nbsp;and&nbsp;system domains.&nbsp;&nbsp;<\/p>\n\n\n\n<p>EDA tools such as&nbsp;<a href=\"https:\/\/www.siemens.com\/en-us\/products\/ic\/calibre-design\/calibre-3d-ic\/3dthermal\/\" target=\"_blank\" rel=\"noreferrer noopener\">Calibre 3DThermal<\/a>&nbsp;enable detailed die-level and stack-level thermal analysis within the design environment,&nbsp;while&nbsp;Simcenter&nbsp;Flotherm&nbsp;extends visibility into package and system-level cooling behavior.&nbsp;<a href=\"https:\/\/eda.sw.siemens.com\/en-US\/ic\/calibre-design\/calibre-3d-ic\/\" target=\"_blank\" rel=\"noreferrer noopener\">Electro-thermal and multi-physics approaches<\/a>&nbsp;extend this capability further by connecting electrical activity,&nbsp;power&nbsp;delivery&nbsp;and mechanical stress to temperature behavior.&nbsp;Together,&nbsp;these capabilities support a closed-loop&nbsp;methodology: early predictive inputs guide&nbsp;floorplanning&nbsp;and&nbsp;progressively refined models validate&nbsp;multiphysics&nbsp;interactions through signoff.&nbsp;<\/p>\n\n\n\n<p class=\"has-text-align-center\">&nbsp;<img loading=\"lazy\" decoding=\"async\" width=\"416\" height=\"234\" src=\"blob:https:\/\/blogs.sw.siemens.com\/82d6847e-2818-4c30-b878-8a199e5bc074\">&nbsp;<br>Figure 3.&nbsp;Calibre&nbsp;3DThermal embeds an optimized custom 3D solver of&nbsp;Simcenter&nbsp;Flotherm&nbsp;into the proven Calibre platform.&nbsp;<\/p>\n\n\n\n<p><strong>#2 System-Driven Thermal Co-Design<\/strong>&nbsp;<\/p>\n\n\n\n<p>In 3D IC systems,&nbsp;thermal behavior must be treated as a system-level design variable,&nbsp;evaluated alongside electrical performance,&nbsp;power delivery&nbsp;integrity&nbsp;and&nbsp;mechanical reliability from the earliest architectural stages.&nbsp;&nbsp;<\/p>\n\n\n\n<p>Rather than addressing heat after placement or packaging decisions are fixed,&nbsp;a&nbsp;system-driven co-design approach integrates predictive thermal modeling into&nbsp;floorplanning,&nbsp;stack definition&nbsp;and&nbsp;package exploration while meaningful flexibility&nbsp;remains.&nbsp;Relocating a high-activity block closer to a primary heat-removal path may increase routing complexity or&nbsp;congestion,&nbsp;yet&nbsp;substantially reduce&nbsp;peak junction temperature and long-term reliability risk. Adjusting die stacking order or interface conductivity can reduce thermal gradients and hotspot severity without altering total power.&nbsp;<\/p>\n\n\n\n<p>Maintaining consistent thermal assumptions across abstraction levels improves correlation and enables predictable performance and reliability targets at signoff.&nbsp;<\/p>\n\n\n\n<p class=\"has-text-align-center\"><img loading=\"lazy\" decoding=\"async\" width=\"623\" height=\"268\" src=\"blob:https:\/\/blogs.sw.siemens.com\/f313da65-1dcc-421a-8e50-b45aaf3343f5\" alt=\"Siemens' thermal solutions for 3D ICs\"><\/p>\n\n\n\n<p>Figure 4.\u00a0Siemens\u2019\u00a0unified thermal design flow for 3D IC\u00a0<\/p>\n\n\n\n<h2 class=\"wp-block-heading\"><strong>Designing thermal confidence into 3D IC packaging&nbsp;with Siemens<\/strong>&nbsp;<\/h2>\n\n\n\n<p>As 3D ICs redefine&nbsp;what\u2019s&nbsp;possible in AI and high-performance computing,&nbsp;heat becomes part of the innovation story.&nbsp;&nbsp;<\/p>\n\n\n\n<p>Thermal confidence is built through integrated thermal co-design where architectural intent,&nbsp;packaging strategy&nbsp;and&nbsp;simulation fidelity evolve together.&nbsp;<\/p>\n\n\n\n<p>Siemens is enabling this shift through fully integrated die-to-system workflows that integrate thermal analysis from early feasibility through final signoff. By linking architecture exploration,&nbsp;detailed implementation&nbsp;and&nbsp;multiphysics&nbsp;validation within a unified environment,&nbsp;teams can model thermal behavior progressively \u2014 refining accuracy as design data matures while preserving design flexibility.&nbsp;&nbsp;<\/p>\n\n\n\n<p><a href=\"https:\/\/resources.sw.siemens.com\/en-US\/white-paper-comprehensive-die-to-system-thermal-management-solutions-for-advanced-3d-ic\/\" target=\"_blank\" rel=\"noreferrer noopener\">Read the white paper<\/a>&nbsp;to see how&nbsp;we can help&nbsp;building&nbsp;thermal confidence into your 3D IC designs from day one.&nbsp;<\/p>\n\n\n\n<p><\/p>\n\n\n\n<h2 class=\"wp-block-heading\"><strong>Frequently asked questions about advanced thermal considerations in 3D IC packaging<\/strong>\u00a0<\/h2>\n\n\n\n<hr class=\"wp-block-separator has-alpha-channel-opacity\"\/>\n\n\n\n<script type=\"application\/ld+json\">\n{\n  \"@context\": \"https:\/\/schema.org\",\n  \"@type\": \"FAQPage\",\n  \"mainEntity\": [\n    {\n      \"@type\": \"Question\",\n      \"name\": \"Why does packaging dominate thermal behavior in 3D ICs?\",\n      \"acceptedAnswer\": {\n        \"@type\": \"Answer\",\n        \"text\": \"Interface resistance and vertical conduction limits introduced by bonding layers, underfill and substrates often outweigh die-level power effects. 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Packaging-level optimization is often required to change peak behavior. This is why stack-level thermal evaluation should occur before finalizing the cooling strategy.\"\n      }\n    }\n  ]\n}\n<\/script>\n\n\n\n<h3 class=\"wp-block-heading\"><strong>Why does packaging dominate thermal behavior in 3D ICs?<\/strong> <\/h3>\n\n\n\n<p>Interface resistance and vertical conduction limits introduced by bonding layers, underfill and substrates often outweigh die-level power effects. Packaging decisions define the primary heat removal paths.<\/p>\n\n\n\n<hr class=\"wp-block-separator has-alpha-channel-opacity\"\/>\n\n\n\n<h3 class=\"wp-block-heading\"><strong>What causes unexpected hotspots late in the design flow?<\/strong> <\/h3>\n\n\n\n<p>Hotspots typically result from die-to-die thermal coupling and interface assumptions that were oversimplified early. These interactions are only revealed when model fidelity increases.<\/p>\n\n\n\n<hr class=\"wp-block-separator has-alpha-channel-opacity\"\/>\n\n\n\n<h3 class=\"wp-block-heading\"><strong>How does advanced thermal modeling differ from basic analysis?<\/strong> <\/h3>\n\n\n\n<p>Advanced modeling explicitly captures die-to-die coupling, interface resistance and package-level effects rather than assuming uniform heat flow.<\/p>\n\n\n\n<hr class=\"wp-block-separator has-alpha-channel-opacity\"\/>\n\n\n\n<h3 class=\"wp-block-heading\"><strong>When should packaging-level thermal analysis begin?<\/strong> <\/h3>\n\n\n\n<p>During architecture and package exploration, before stack order, materials and boundaries become fixed.<\/p>\n\n\n\n<hr class=\"wp-block-separator has-alpha-channel-opacity\"\/>\n\n\n\n<h3 class=\"wp-block-heading\"><strong>Why doesn&#8217;t additional cooling always fix the problem?<\/strong> <\/h3>\n\n\n\n<p>If internal thermal resistance remains high, increasing cooling capacity lowers average temperature but does not eliminate localized hotspots. Packaging-level optimization is often required to change peak behavior. This is why stack-level thermal evaluation should occur before finalizing the cooling strategy.<\/p>\n","protected":false},"excerpt":{"rendered":"<p>Not long ago,&nbsp;OpenAI CEO Sam Altman remarked that advanced AI video generation workloads were pushing GPUs toward their thermal limits&#8230;.<\/p>\n","protected":false},"author":116848,"featured_media":1345,"comment_status":"open","ping_status":"closed","sticky":false,"template":"","format":"standard","meta":{"spanish_translation":"","french_translation":"","german_translation":"","italian_translation":"","polish_translation":"","japanese_translation":"","chinese_translation":"","footnotes":""},"categories":[1],"tags":[473,548,549],"industry":[],"product":[],"coauthors":[569],"class_list":["post-1342","post","type-post","status-publish","format-standard","has-post-thumbnail","hentry","category-news","tag-3d-ic","tag-advanced-packaging","tag-siemens-eda"],"featured_image_url":"https:\/\/blogs.sw.siemens.com\/wp-content\/uploads\/sites\/64\/2026\/02\/Resources-_-Calibre-3D-IC-_-Siemens.jpg","_links":{"self":[{"href":"https:\/\/blogs.sw.siemens.com\/semiconductor-packaging\/wp-json\/wp\/v2\/posts\/1342","targetHints":{"allow":["GET"]}}],"collection":[{"href":"https:\/\/blogs.sw.siemens.com\/semiconductor-packaging\/wp-json\/wp\/v2\/posts"}],"about":[{"href":"https:\/\/blogs.sw.siemens.com\/semiconductor-packaging\/wp-json\/wp\/v2\/types\/post"}],"author":[{"embeddable":true,"href":"https:\/\/blogs.sw.siemens.com\/semiconductor-packaging\/wp-json\/wp\/v2\/users\/116848"}],"replies":[{"embeddable":true,"href":"https:\/\/blogs.sw.siemens.com\/semiconductor-packaging\/wp-json\/wp\/v2\/comments?post=1342"}],"version-history":[{"count":5,"href":"https:\/\/blogs.sw.siemens.com\/semiconductor-packaging\/wp-json\/wp\/v2\/posts\/1342\/revisions"}],"predecessor-version":[{"id":1353,"href":"https:\/\/blogs.sw.siemens.com\/semiconductor-packaging\/wp-json\/wp\/v2\/posts\/1342\/revisions\/1353"}],"wp:featuredmedia":[{"embeddable":true,"href":"https:\/\/blogs.sw.siemens.com\/semiconductor-packaging\/wp-json\/wp\/v2\/media\/1345"}],"wp:attachment":[{"href":"https:\/\/blogs.sw.siemens.com\/semiconductor-packaging\/wp-json\/wp\/v2\/media?parent=1342"}],"wp:term":[{"taxonomy":"category","embeddable":true,"href":"https:\/\/blogs.sw.siemens.com\/semiconductor-packaging\/wp-json\/wp\/v2\/categories?post=1342"},{"taxonomy":"post_tag","embeddable":true,"href":"https:\/\/blogs.sw.siemens.com\/semiconductor-packaging\/wp-json\/wp\/v2\/tags?post=1342"},{"taxonomy":"industry","embeddable":true,"href":"https:\/\/blogs.sw.siemens.com\/semiconductor-packaging\/wp-json\/wp\/v2\/industry?post=1342"},{"taxonomy":"product","embeddable":true,"href":"https:\/\/blogs.sw.siemens.com\/semiconductor-packaging\/wp-json\/wp\/v2\/product?post=1342"},{"taxonomy":"author","embeddable":true,"href":"https:\/\/blogs.sw.siemens.com\/semiconductor-packaging\/wp-json\/wp\/v2\/coauthors?post=1342"}],"curies":[{"name":"wp","href":"https:\/\/api.w.org\/{rel}","templated":true}]}}